DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 전덕영 | - |
dc.contributor.advisor | Jeon, Duk-Young | - |
dc.contributor.author | 정진만 | - |
dc.contributor.author | Jeong, Jin-Man | - |
dc.date.accessioned | 2011-12-15T01:30:09Z | - |
dc.date.available | 2011-12-15T01:30:09Z | - |
dc.date.issued | 1996 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=108833&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/50610 | - |
dc.description | 학위논문(석사) - 한국과학기술원 : 재료공학과, 1996.8, [ vi, 64 p. ] | - |
dc.language | kor | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | 미세리소그래피 | - |
dc.subject | 부분간섭성 | - |
dc.subject | 홉킨스 이론 | - |
dc.subject | 근접효과 | - |
dc.subject | 삼위상형 위상반전매스크 | - |
dc.subject | Tri-phase type PSM | - |
dc.subject | Microlithography | - |
dc.subject | Partial coherence | - |
dc.subject | Hopkins theory | - |
dc.subject | Proximity effect | - |
dc.title | 0.25mm 광리소그래피 결상에 존재하는 근접효과와 그 감소 방안에 관한 연구 | - |
dc.title.alternative | A study of the proximity effect present in the image forming process of the 0.25 micrometer photolithography and its reduction | - |
dc.type | Thesis(Master) | - |
dc.identifier.CNRN | 108833/325007 | - |
dc.description.department | 한국과학기술원 : 재료공학과, | - |
dc.identifier.uid | 000947511 | - |
dc.contributor.localauthor | 전덕영 | - |
dc.contributor.localauthor | Jeon, Duk-Young | - |
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