ALD와 PEALD를 이용한 $Al_2O_3$ 박막 증착에 관한 연구A study on the $Al_2O_3$ thin film deposition by ALD and PEALD
- Advisors
- 강상원researcher; Kang, Sang-Wonresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2003
- Identifier
- 231093/325007 / 000985336
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 2003.8, [ viii, 112 p. ]
- Keywords
박막; 계면 산화막; 알루미나; 원자층 단위 증착법; 절연막; interface stability; alumina; atomic layer deposition; PEALD; ALD
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.