광리소그래피 위상변위마스크용 Cr-Al-O-N 박막의 개발 = Development of chromium aluminum oxynitride films as a phase shifting mask material for optical lithography

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Advisors
노광수researcherNo, Kwang-Sooresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2001
Identifier
165670/325007 / 000975063
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 2001.2, [ xxi, 214 p. ]

Keywords

크로뮴 알루미늄 옥시나이트라이드; 광리소그래피; 위상변위마스크; 박막; Film; Chromium Aluminum Oxynitride; Optical Lithography; Phase Shifting Mask

URI
http://hdl.handle.net/10203/50405
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165670&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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