구리 박막과 반응성 플라즈마의 건식 식각반응 특성에 관한 연구A study on the characteristics of dry etch reactions between Cu thin film and reactive plasmas
- Advisors
- 이정용researcher; Lee, Jeong-Yongresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1999
- Identifier
- 150157/325007 / 000945025
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 1999.2, [ ix, 102 p. ]
- Keywords
Reaction mechanism; Reaction characteristics; Dry etching; Reactive plasma; Cu; 반응 기구; 반응 특성; 반응성 플라즈마; 건식 식각; 구리
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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