구리 박막과 반응성 플라즈마의 건식 식각반응 특성에 관한 연구 = A study on the characteristics of dry etch reactions between Cu thin film and reactive plasmas

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Advisors
이정용researcherLee, Jeong-Yongresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1999
Identifier
150157/325007 / 000945025
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 1999.2, [ ix, 102 p. ]

Keywords

Reaction mechanism; Reaction characteristics; Dry etching; Reactive plasma; Cu; 반응 기구; 반응 특성; 반응성 플라즈마; 건식 식각; 구리

URI
http://hdl.handle.net/10203/50347
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=150157&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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