텅스텐 박막의 저압화학 증착 기구 및 증착층의 특성에 관한 연구A study on the mechanisms of tungsten low pressure chemical vapor deposition and the characteristics of the deposited layer

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dc.contributor.advisor천성순-
dc.contributor.advisor남수우-
dc.contributor.advisorChun, Soung-Soon-
dc.contributor.advisorNam, Soo-Woo-
dc.contributor.author박흥락-
dc.contributor.authorPark, Heung-Lak-
dc.date.accessioned2011-12-15T01:05:18Z-
dc.date.available2011-12-15T01:05:18Z-
dc.date.issued1989-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=61389&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/50319-
dc.description학위논문(박사) - 한국과학기술원 : 재료공학과, 1989.2, [ [v], 134 p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.subjectLow pressure chemical vapor deposition.-
dc.title텅스텐 박막의 저압화학 증착 기구 및 증착층의 특성에 관한 연구-
dc.title.alternativeA study on the mechanisms of tungsten low pressure chemical vapor deposition and the characteristics of the deposited layer-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN61389/325007-
dc.description.department한국과학기술원 : 재료공학과, -
dc.identifier.uid000845136-
dc.contributor.localauthor박흥락-
dc.contributor.localauthorPark, Heung-Lak-
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MS-Theses_Ph.D.(박사논문)
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