텅스텐 박막의 저압화학 증착 기구 및 증착층의 특성에 관한 연구A study on the mechanisms of tungsten low pressure chemical vapor deposition and the characteristics of the deposited layer

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Advisors
천성순researcher남수우researcherChun, Soung-SoonresearcherNam, Soo-Wooresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
1989
Identifier
61389/325007 / 000845136
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 1989.2, [ [v], 134 p. ]

Keywords

Low pressure chemical vapor deposition.

URI
http://hdl.handle.net/10203/50319
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=61389&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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