MRAM 용 자기터널접합 내 절연층의 산화조건 및 미세조직변화에 관한 고찰Microstructural variation with the various oxidizing conditions of the oxide layer in magnetic tunnel junction used in MRAM
- Advisors
- 이혁모researcher; Lee, Hyuck-Moresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2002
- Identifier
- 177281/325007 / 000985168
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 2002.8, [ xi, 131 p. ]
- Keywords
자기터널접합; 절연층; MRAM; Magnetic Tunnel Junction
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.