Arsenic 이온이 주입된 실리콘에서 결함 생성에 관한 투과전자현미경 연구 = A transmission electron microscopy study on the generation of defects in $As^+$ implanted silicon

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Advisors
이정용researcherLee, Jeong-Yongresearcher
Description
한국과학기술원 : 재료공학과,
Publisher
한국과학기술원
Issue Date
2002
Identifier
174588/325007 / 000985197
Language
kor
Description

학위논문(박사) - 한국과학기술원 : 재료공학과, 2002.2, [ xi, 136 p. ]

Keywords

응력; 결함; 이온주입; 투과전자현미경; Transmission electron microscopy; stress; Defect; Arsenic implantation

URI
http://hdl.handle.net/10203/50248
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=174588&flag=dissertation
Appears in Collection
MS-Theses_Ph.D.(박사논문)
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