Arsenic 이온이 주입된 실리콘에서 결함 생성에 관한 투과전자현미경 연구A transmission electron microscopy study on the generation of defects in $As^+$ implanted silicon
- Advisors
- 이정용researcher; Lee, Jeong-Yongresearcher
- Description
- 한국과학기술원 : 재료공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 2002
- Identifier
- 174588/325007 / 000985197
- Language
- kor
- Description
학위논문(박사) - 한국과학기술원 : 재료공학과, 2002.2, [ xi, 136 p. ]
- Keywords
응력; 결함; 이온주입; 투과전자현미경; Transmission electron microscopy; stress; Defect; Arsenic implantation
- Appears in Collection
- MS-Theses_Ph.D.(박사논문)
- Files in This Item
- There are no files associated with this item.
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