DSpace at KOASAS: 플라즈마 화학증착법에 의해 제조된 기억소자용 고유전 탄탈륨 산화박막에 관한 연구

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College of Engineering(공과대학)Dept. of Materials Science and Engineering(신소재공학과)MS-Theses_Ph.D.(박사논문)

플라즈마 화학증착법에 의해 제조된 기억소자용 고유전 탄탈륨 산화박막에 관한 연구PECVD $Ta_2O_5$ dielectric thin films for memory devices

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김일 / Kim, Il

Advisors: 천성순 researcher; Chun, Soung-Soon researcher

Description: 한국과학기술원 : 전자재료공학과,

Publisher: 한국과학기술원

Issue Date: 1995

Identifier: 99213/325007 / 000895089

Language: kor

Description: 학위논문(박사) - 한국과학기술원 : 전자재료공학과, 1995.2, [ vi, 136 p. ]

URI: http://hdl.handle.net/10203/49917

Link: http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=99213&flag=dissertation

Appears in Collection: MS-Theses_Ph.D.(박사논문)

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플라즈마 화학증착법에 의해 제조된 기억소자용 고유전 탄탈륨 산화박막에 관한 연구PECVD $Ta_2O_5$ dielectric thin films for memory devices

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