Synthesis of copolymers containing hydroxycyclohexyl methacrylate and their application as DUV resist히드록시시클로헥실 메타크릴레이트가 포함된 공중합체의 합성 및 원자외선 레지스트로서의 응용

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dc.contributor.advisorKim, Jin-Baek-
dc.contributor.advisor김진백-
dc.contributor.authorKim, Jae-Young-
dc.contributor.author김재영-
dc.date.accessioned2011-12-15-
dc.date.available2011-12-15-
dc.date.issued1998-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=143546&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/49667-
dc.description학위논문(박사) - 한국과학기술원 : 신소재공학과, 1998.8, [ xii, 94 p. ]-
dc.languageeng-
dc.publisher한국과학기술원-
dc.subjectAlicyclic methacrylate-
dc.subjectHydroxycyclohexyl methacrylate-
dc.subjectDUV photoresist-
dc.subjectDry-etching resistance-
dc.subject건식내에칭성-
dc.subject지방족 고리형 메타크릴레이트-
dc.subject히드록시시클로헥실 메타크릴레이트-
dc.subject원자외선 레지스트-
dc.titleSynthesis of copolymers containing hydroxycyclohexyl methacrylate and their application as DUV resist-
dc.title.alternative히드록시시클로헥실 메타크릴레이트가 포함된 공중합체의 합성 및 원자외선 레지스트로서의 응용-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN143546/325007-
dc.description.department한국과학기술원 : 신소재공학과, -
dc.identifier.uid000939063-
dc.contributor.localauthorKim, Jae-Young-
dc.contributor.localauthor김재영-
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MS-Theses_Ph.D.(박사논문)
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