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NO Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1
광리소그래피 위상변위마스크용 Cr-Al-O-N 박막의 개발 = Development of chromium aluminum oxynitride films as a phase shifting mask material for optical lithographylink

김은아; Kim, Eun-Ah; 노광수; No, Kwang-Soo, 한국과학기술원, 2001

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