제조공정과 사용조건을 고려한 X-선 마스크의 변형해석 = Analysis of structural distortions of an X-ray mask considering fabrication processes and writing conditions

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Advisors
곽병만researcherKwak, Byung-Manresearcher
Description
한국과학기술원 : 기계공학과,
Publisher
한국과학기술원
Issue Date
1997
Identifier
114417/325007 / 000953103
Language
kor
Description

학위논문(석사) - 한국과학기술원 : 기계공학과, 1997.2, [ ix, 70 p. ]

Keywords

X-ray mask; 변형해석; X-선 마스크; Membrane distortion; Pattern distortion; OPD; IPD; X-ray lithography

URI
http://hdl.handle.net/10203/46602
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=114417&flag=dissertation
Appears in Collection
ME-Theses_Master(석사논문)
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