제조공정과 사용조건을 고려한 X-선 마스크의 변형해석Analysis of structural distortions of an X-ray mask considering fabrication processes and writing conditions
- Advisors
- 곽병만researcher; Kwak, Byung-Manresearcher
- Description
- 한국과학기술원 : 기계공학과,
- Publisher
- 한국과학기술원
- Issue Date
- 1997
- Identifier
- 114417/325007 / 000953103
- Language
- kor
- Description
학위논문(석사) - 한국과학기술원 : 기계공학과, 1997.2, [ ix, 70 p. ]
- Keywords
X-ray mask; 변형해석; X-선 마스크; Membrane distortion; Pattern distortion; OPD; IPD; X-ray lithography
- Appears in Collection
- ME-Theses_Master(석사논문)
- Files in This Item
- There are no files associated with this item.
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