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Effect of additional low temperature RTA on ultra-shallow p+-n junction formation Cho, Byung Jin; Lee, KH; Oh, JG; Kim, JC, 11th International Conf. on Ion Implantation Technology, pp.634 - 637, The Korea Society of Applied Physics, 1997-05-22 |
Formation of ultra-shallow junction by point defect engineering Cho, Byung Jin; Lee, KH; Sohn, YS; Oh, JG; Kim, JC, Ion Implantation Conf., pp.0 - 0, 1996-04-05 |
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