Compressed-carbon dioxide (CO2) assisted nanoimprint lithography using polymeric mold

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We have represented a compressed carbon dioxide (CO2) assisted nanoimprint lithography (CO2-NIL) technique using a fluoropolymer mold. Glass transition temperature (T-g) of polymethylmethacrylate (PMMA) tinder the compressed-CO2 is apparently depressed by the absorption of CO2, and the plasticized PMMS has enough mobilitv to rise into the groove of fluoropolymer mold. As a result, the 100 nm level of submicron features are uniformly fabricated on the polymer surface over a large area, and the use of fluoropolymer mold having a low interfacial energy assures the clean release from the patterned surface without a release agent. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) observation confirm these results. CO2-NIL process could fabricate micro/nano-patterns without thermal cycle, high pressure and anti-adhesion layer compared to conventional NIL. (c) 2006 Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
2006-10
Language
English
Article Type
Article
Keywords

IMPRINT LITHOGRAPHY; FABRICATION

Citation

MICROELECTRONIC ENGINEERING, v.83, no.10, pp.1957 - 1960

ISSN
0167-9317
DOI
10.1016/j.mee.2006.02.003
URI
http://hdl.handle.net/10203/4366
Appears in Collection
CBE-Journal Papers(저널논문)
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