(An) infrared thin-layer cell fabricated in a silicon micromachined structure for in situ FT-IR monitoring of electrochemical reaction = 마이크로 머신 기술로 제작된 실시간 FT-IR 관찰용 얇은 층 전기화학 셀

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A thin-layer cell in a micromachined structure have been designed and fabricated for in situ FT-IR monitoring of electrochemical reactions. The cavity of thin-layer cell has been made using anisotropic etching of silicon by TMAH (tetramethylammonium hydroxide). Thin film gold working electrode mesh, gold counter electrode and silver reference electrode layers were patterned by lift-off method, and the thin film silver/silver chloride reference electrode was formed by surface chemical reaction of thin-film silver in $FeCl_3$ solution. Electrochemical, spectroscopic and spectroelectrochemical characteristics have been tested using the fabricated device and have been compared with those of commercially available $CaF_2$ thin-layer cell. For both cells, the same concentration of chemicals were used; 2mM $K_3Fe(CN)_6$ in aqueous solution and 2mM ferrocene ($C_5H_5-Fe-C_5H_5$) in dichloromethane ($CH_2Cl_2$) solution. Cyclic voltammetry has been used to test electro-chemical characteristics while FT-IR spectrometry has been used to monitor spectroscopic characteristics. The possibility of fabricated thin-layer cell has been tested successfully for both aqueous and nonaqueous solvent system.
Advisors
Yoon, Eui-SikresearcherHong, Song-Cheolresearcher윤의식researcher홍성철researcher
Description
한국과학기술원 : 전기및전자공학전공,
Publisher
한국과학기술원
Issue Date
2001
Identifier
165885/325007 / 000993540
Language
eng
Description

학위논문(석사) - 한국과학기술원 : 전기및전자공학전공, 2001.2, [ iii, 56 p. ]

Keywords

FT-IR; electrochemical; silicon; 얇은 층 전기화학 셀; 마이크로 머신; FT-IR; 전기화학; 셀; Thin-layer cell; Micromachining

URI
http://hdl.handle.net/10203/37447
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=165885&flag=dissertation
Appears in Collection
EE-Theses_Master(석사논문)
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