저온 공정을 사용한 ECR $N_2O$-플라즈마 산화막을 가지는 다결정 실리콘 박막 트랜지스터 EEPROM 소자A polysilicon thin film transistor EEPROM cell with ECR $N_2O-plasma$ oxide using low temperature process
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.advisor | 한철희 | - |
| dc.contributor.advisor | Han, Chul-Hi | - |
| dc.contributor.author | 오정훈 | - |
| dc.contributor.author | Oh, Jung-Hoon | - |
| dc.date.accessioned | 2011-12-14T01:44:14Z | - |
| dc.date.available | 2011-12-14T01:44:14Z | - |
| dc.date.issued | 1999 | - |
| dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=150880&flag=dissertation | - |
| dc.identifier.uri | http://hdl.handle.net/10203/37191 | - |
| dc.description | 학위논문(석사) - 한국과학기술원 : 전기및전자공학과, 1999.2, [ ii, 31 p. ] | - |
| dc.language | kor | - |
| dc.publisher | 한국과학기술원 | - |
| dc.subject | 저온공정 | - |
| dc.subject | EEPROM | - |
| dc.subject | 박막트랜지스터 | - |
| dc.subject | 다결정실리콘 | - |
| dc.subject | 플라즈마산화막 | - |
| dc.subject | Plasma oxide | - |
| dc.subject | Low temperature process | - |
| dc.subject | EEPROM | - |
| dc.subject | TFT | - |
| dc.subject | Polysilicon | - |
| dc.title | 저온 공정을 사용한 ECR $N_2O$-플라즈마 산화막을 가지는 다결정 실리콘 박막 트랜지스터 EEPROM 소자 | - |
| dc.title.alternative | A polysilicon thin film transistor EEPROM cell with ECR $N_2O-plasma$ oxide using low temperature process | - |
| dc.type | Thesis(Master) | - |
| dc.identifier.CNRN | 150880/325007 | - |
| dc.description.department | 한국과학기술원 : 전기및전자공학과, | - |
| dc.identifier.uid | 000973408 | - |
| dc.contributor.localauthor | 한철희 | - |
| dc.contributor.localauthor | Han, Chul-Hi | - |
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- EE-Theses_Master(석사논문)
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