Improvement of electrical and optoelectronic properties of ZnO thin films by plasma nitridation treatment
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Minje | ko |
| dc.contributor.author | Baek, Jongsu | ko |
| dc.contributor.author | Kim, Sunjae | ko |
| dc.contributor.author | Bae, Joonyup | ko |
| dc.contributor.author | Cho, Byung-Jin | ko |
| dc.contributor.author | Kim, Jihyun | ko |
| dc.contributor.author | Hwang, Wan Sik | ko |
| dc.date.accessioned | 2024-07-23T08:00:06Z | - |
| dc.date.available | 2024-07-23T08:00:06Z | - |
| dc.date.created | 2024-07-22 | - |
| dc.date.issued | 2024-07 | - |
| dc.identifier.citation | Optical Materials | - |
| dc.identifier.issn | 0925-346 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/320310 | - |
| dc.language | English | - |
| dc.publisher | Elsevier | - |
| dc.title | Improvement of electrical and optoelectronic properties of ZnO thin films by plasma nitridation treatment | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.publicationname | Optical Materials | - |
| dc.contributor.localauthor | Cho, Byung-Jin | - |
| dc.contributor.nonIdAuthor | Kim, Minje | - |
| dc.contributor.nonIdAuthor | Baek, Jongsu | - |
| dc.contributor.nonIdAuthor | Kim, Sunjae | - |
| dc.contributor.nonIdAuthor | Bae, Joonyup | - |
| dc.contributor.nonIdAuthor | Kim, Jihyun | - |
| dc.contributor.nonIdAuthor | Hwang, Wan Sik | - |
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