Power Reduction in Punch-Through Current-Based Electro-Thermal Annealing in Gate-All-Around FETs

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dc.contributor.authorKim, Min-Kyeongko
dc.contributor.authorChoi, Yang-Kyuko
dc.contributor.authorPark, Jun-Youngko
dc.date.accessioned2022-02-08T06:43:48Z-
dc.date.available2022-02-08T06:43:48Z-
dc.date.created2022-02-08-
dc.date.created2022-02-08-
dc.date.created2022-02-08-
dc.date.issued2022-01-
dc.identifier.citationMICROMACHINES, v.13, no.1-
dc.identifier.issn2072-666X-
dc.identifier.urihttp://hdl.handle.net/10203/292124-
dc.description.abstractDevice guidelines for reducing power with punch-through current annealing in gate-all-around (GAA) FETs were investigated based on three-dimensional (3D) simulations. We studied and compared how different geometric dimensions and materials of GAA FETs impact heat management when down-scaling. In order to maximize power efficiency during electro-thermal annealing (ETA), applying gate module engineering was more suitable than engineering the isolation or source drain modules.-
dc.languageEnglish-
dc.publisherMDPI-
dc.titlePower Reduction in Punch-Through Current-Based Electro-Thermal Annealing in Gate-All-Around FETs-
dc.typeArticle-
dc.identifier.wosid000746012300001-
dc.identifier.scopusid2-s2.0-85123052565-
dc.type.rimsART-
dc.citation.volume13-
dc.citation.issue1-
dc.citation.publicationnameMICROMACHINES-
dc.identifier.doi10.3390/mi13010124-
dc.contributor.localauthorChoi, Yang-Kyu-
dc.contributor.nonIdAuthorKim, Min-Kyeong-
dc.contributor.nonIdAuthorPark, Jun-Young-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorannealing-
dc.subject.keywordAuthordielectric-
dc.subject.keywordAuthorgate-all-around (GAA)-
dc.subject.keywordAuthorhot-carrier injection (HCI)-
dc.subject.keywordAuthorpower consumption-
dc.subject.keywordAuthorpunch-through-
dc.subject.keywordAuthorreliability-
dc.subject.keywordAuthorlogic transistors-
dc.subject.keywordPlusDEGRADATION-
dc.subject.keywordPlusIMPROVEMENT-
dc.subject.keywordPlusMODEL-
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