Universal Patterning for 2D Van der Waals Materials via Direct Optical Lithography

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Advanced patterning techniques are essential to pursue applications of 2D van der Waals (vdW) materials in electrical and optical devices. Here, the direct optical lithography (DOL) of vdW materials by single-pulse irradiation of high-power light through a photomask is reported. The DOL exhibits large-scale patterning with a sub-micrometer resolution and clean surface, which can be applied to various combinations of vdW materials and substrates. In addition, the thermal profile during DOL is investigated using the finite element method, and the ideal conditions of DOL according to the materials and substrates are determined.
Publisher
WILEY-V C H VERLAG GMBH
Issue Date
2021-11
Language
English
Article Type
Article
Citation

ADVANCED FUNCTIONAL MATERIALS, v.31, no.47, pp.2105302

ISSN
1616-301X
DOI
10.1002/adfm.202105302
URI
http://hdl.handle.net/10203/289297
Appears in Collection
EE-Journal Papers(저널논문)PH-Journal Papers(저널논문)MS-Journal Papers(저널논문)
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