Wafer-Scale Unidirectional Alignment of Supramolecular Columns on Faceted Surfaces

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The long-range alignment of supramolecular structures must be engineered as a first step toward advanced nanopatterning processes aimed at miniaturizing features to dimensions below 5 nm. This study introduces a facile method of directing the orientation of supramolecular columns over wafer-scale areas using faceted surfaces. Supramolecular columns with features on the sub-5 nm scale were highly aligned in a direction orthogonal to that of the facet patterning on unidirectional and nanoscopic faceted surface patterns. This unidirectional alignment of supramolecular columns is also observed by varying the thickness of the supramolecular film or by altering the dimensions of the facet pattern. The ordering behavior of the supramolecular columns can be attributed to the triangular depth profile of the bottom facet pattern. Furthermore, this directed self-assembly principle allows for the continuous alignment of supramolecular structures across ultralarge distances on flexible patterned substrates.
Publisher
AMER CHEMICAL SOC
Issue Date
2021-07
Language
English
Article Type
Article
Citation

ACS NANO, v.15, no.7, pp.11762 - 11769

ISSN
1936-0851
DOI
10.1021/acsnano.1c02632
URI
http://hdl.handle.net/10203/287426
Appears in Collection
MS-Journal Papers(저널논문)CBE-Journal Papers(저널논문)
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