Two-photon stereolithography

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Two-photon stereolithography based on photopolymerization provides the ability to fabricate real three-dimensional (3D) microstructures beyond the resolution of focal size. In this paper, our recent research focusing on improvement of spatial resolution in two-photon stereolithography is reviewed. The influence of system and fabrication conditions in relation to the spatial resolution is discussed. For small and low aspect ratio voxels, a minimum power and minimum exposure time (MPMT) scheme is introduced. During the two-photon process, an ascending technique, wherein the truncation amount of volumetric pixels is controlled, can be applied to improve the resolution of two-dimensional patterns. 3D Microfabrication with less than 100 nm resolution can be realized by using the radical quenching effect. After the two-photon process, the resolution of fabricated patterns can be refined to 60 nm by post-processing of plasma ashing.
Publisher
WORLD SCIENTIFIC PUBL CO PTE LTD
Issue Date
2007-03
Language
English
Article Type
Article
Keywords

3-DIMENSIONAL MICROFABRICATION; SPATIAL-RESOLUTION; PHOTOPOLYMERIZATION; POLYMERIZATION; FABRICATION; MICROSTRUCTURES; NANOFABRICATION; VOXELS

Citation

JOURNAL OF NONLINEAR OPTICAL PHYSICS & MATERIALS, v.16, pp.59 - 73

ISSN
0218-8635
URI
http://hdl.handle.net/10203/2769
Appears in Collection
ME-Journal Papers(저널논문)
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