Single-Step Production of Doubly Re-entrant Microstructures through Reaction-Diffusion Photolithography for Omniphobic Surfaces
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 배형한 | ko |
| dc.contributor.author | 김종빈 | ko |
| dc.contributor.author | 김신현 | ko |
| dc.date.accessioned | 2020-10-21T02:57:14Z | - |
| dc.date.available | 2020-10-21T02:57:14Z | - |
| dc.date.created | 2020-10-15 | - |
| dc.date.issued | 2020-10-08 | - |
| dc.identifier.citation | 한국고분자학회 2020 추계학술대회 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/276789 | - |
| dc.language | English | - |
| dc.publisher | 한국고분자학회 | - |
| dc.title | Single-Step Production of Doubly Re-entrant Microstructures through Reaction-Diffusion Photolithography for Omniphobic Surfaces | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | 한국고분자학회 2020 추계학술대회 | - |
| dc.identifier.conferencecountry | KO | - |
| dc.identifier.conferencelocation | 온라인 | - |
| dc.contributor.localauthor | 김신현 | - |
- Appears in Collection
- CBE-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.