Photoreduction of graphene oxides using a femtosecond laser direct writing method
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lim, Chin Huat Joel | ko |
| dc.contributor.author | Munji, Low | ko |
| dc.contributor.author | Lee, Hyub | ko |
| dc.contributor.author | Murukeshan, Vadakke Matham | ko |
| dc.contributor.author | KIM, Young-Jin | ko |
| dc.date.accessioned | 2020-03-19T04:27:36Z | - |
| dc.date.available | 2020-03-19T04:27:36Z | - |
| dc.date.created | 2019-12-30 | - |
| dc.date.issued | 2017-06 | - |
| dc.identifier.citation | International Symposium on Green Manufacturing and Applications (ISGMA) 2017 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/273001 | - |
| dc.description.abstract | The photoreduction of graphene oxide (GO) films using femtosecond laser direct writing (FsLDW) was investigated at the wavelengths of 343 nm and 515 nm to investigate the contributions of photochemical and photothermal effects in the photoreduction process. | - |
| dc.language | English | - |
| dc.publisher | IEEE | - |
| dc.title | Photoreduction of graphene oxides using a femtosecond laser direct writing method | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | International Symposium on Green Manufacturing and Applications (ISGMA) 2017 | - |
| dc.identifier.conferencecountry | KO | - |
| dc.identifier.conferencelocation | Singapore | - |
| dc.identifier.doi | 10.1109/CLEOPR.2017.8118799 | - |
| dc.contributor.nonIdAuthor | Lim, Chin Huat Joel | - |
| dc.contributor.nonIdAuthor | Munji, Low | - |
| dc.contributor.nonIdAuthor | Lee, Hyub | - |
| dc.contributor.nonIdAuthor | Murukeshan, Vadakke Matham | - |
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