Photoreduction of graphene oxides using a femtosecond laser direct writing method

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dc.contributor.authorLim, Chin Huat Joelko
dc.contributor.authorMunji, Lowko
dc.contributor.authorLee, Hyubko
dc.contributor.authorMurukeshan, Vadakke Mathamko
dc.contributor.authorKIM, Young-Jinko
dc.date.accessioned2020-03-19T04:27:36Z-
dc.date.available2020-03-19T04:27:36Z-
dc.date.created2019-12-30-
dc.date.issued2017-06-
dc.identifier.citationInternational Symposium on Green Manufacturing and Applications (ISGMA) 2017-
dc.identifier.urihttp://hdl.handle.net/10203/273001-
dc.description.abstractThe photoreduction of graphene oxide (GO) films using femtosecond laser direct writing (FsLDW) was investigated at the wavelengths of 343 nm and 515 nm to investigate the contributions of photochemical and photothermal effects in the photoreduction process.-
dc.languageEnglish-
dc.publisherIEEE-
dc.titlePhotoreduction of graphene oxides using a femtosecond laser direct writing method-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameInternational Symposium on Green Manufacturing and Applications (ISGMA) 2017-
dc.identifier.conferencecountryKO-
dc.identifier.conferencelocationSingapore-
dc.identifier.doi10.1109/CLEOPR.2017.8118799-
dc.contributor.nonIdAuthorLim, Chin Huat Joel-
dc.contributor.nonIdAuthorMunji, Low-
dc.contributor.nonIdAuthorLee, Hyub-
dc.contributor.nonIdAuthorMurukeshan, Vadakke Matham-
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