SiC-Based 4 MHz 10 kW ZVS Inverter With Fast Resonance Frequency Tracking Control for High-Density Plasma Generators

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dc.contributor.authorPark, Se-Hongko
dc.contributor.authorSohn, Yeong-Hoonko
dc.contributor.authorCho, Gyu-Hyeongko
dc.date.accessioned2020-02-05T02:20:09Z-
dc.date.available2020-02-05T02:20:09Z-
dc.date.created2020-02-04-
dc.date.created2020-02-04-
dc.date.issued2020-03-
dc.identifier.citationIEEE TRANSACTIONS ON POWER ELECTRONICS, v.35, no.3, pp.3266 - 3275-
dc.identifier.issn0885-8993-
dc.identifier.urihttp://hdl.handle.net/10203/272066-
dc.description.abstractA high-efficiency power conversion system to drive high-density plasma is proposed for plasma CO2 reforming (PCR). For high durability, the system is designed for inductively coupled plasma (ICP) without performance degradation. The proposed system consists of a novel control method and a 10 kW 4 MHz switching inverter to obtain a high-induced electromotive force that is necessary to generate and maintain ICP. The proposed control method quickly tracks the resonance frequency of plasma impedance with high-frequency resolution, which guarantees zero-voltage switching operation and power supply under highly variable plasma impedance. Moreover, the inverter is designed to be suitable for high-power high-frequency switching operation, consisting of SiC-mosfets and gate driver circuits with a negative turn-off voltage. Owing to the proposed system, plasma with much higher density than that of conventional plasma generators can be safely driven. A prototype system is presented to demonstrate the proposed operation, and the technical feasibility of PCR is verified. The proposed control can also be widely utilized for various high-frequency switching inverters that operate in variable load impedance.-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.titleSiC-Based 4 MHz 10 kW ZVS Inverter With Fast Resonance Frequency Tracking Control for High-Density Plasma Generators-
dc.typeArticle-
dc.identifier.wosid000507286000087-
dc.identifier.scopusid2-s2.0-85077233823-
dc.type.rimsART-
dc.citation.volume35-
dc.citation.issue3-
dc.citation.beginningpage3266-
dc.citation.endingpage3275-
dc.citation.publicationnameIEEE TRANSACTIONS ON POWER ELECTRONICS-
dc.identifier.doi10.1109/TPEL.2019.2932056-
dc.contributor.localauthorCho, Gyu-Hyeong-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorHigh-density plasma-
dc.subject.keywordAuthorhigh-frequency high-power inverter-
dc.subject.keywordAuthorhigh-frequency zero-voltage switching (ZVS) inverter-
dc.subject.keywordAuthorinductively coupled plasma (ICP)-
dc.subject.keywordAuthorresonance frequency tracking-
dc.subject.keywordAuthorvariable impedance-
dc.subject.keywordPlusMODULATION-
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