DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Se-Hong | ko |
dc.contributor.author | Sohn, Yeong-Hoon | ko |
dc.contributor.author | Cho, Gyu-Hyeong | ko |
dc.date.accessioned | 2020-02-05T02:20:09Z | - |
dc.date.available | 2020-02-05T02:20:09Z | - |
dc.date.created | 2020-02-04 | - |
dc.date.created | 2020-02-04 | - |
dc.date.created | 2020-02-04 | - |
dc.date.issued | 2020-03 | - |
dc.identifier.citation | IEEE TRANSACTIONS ON POWER ELECTRONICS, v.35, no.3, pp.3266 - 3275 | - |
dc.identifier.issn | 0885-8993 | - |
dc.identifier.uri | http://hdl.handle.net/10203/272066 | - |
dc.description.abstract | A high-efficiency power conversion system to drive high-density plasma is proposed for plasma CO2 reforming (PCR). For high durability, the system is designed for inductively coupled plasma (ICP) without performance degradation. The proposed system consists of a novel control method and a 10 kW 4 MHz switching inverter to obtain a high-induced electromotive force that is necessary to generate and maintain ICP. The proposed control method quickly tracks the resonance frequency of plasma impedance with high-frequency resolution, which guarantees zero-voltage switching operation and power supply under highly variable plasma impedance. Moreover, the inverter is designed to be suitable for high-power high-frequency switching operation, consisting of SiC-mosfets and gate driver circuits with a negative turn-off voltage. Owing to the proposed system, plasma with much higher density than that of conventional plasma generators can be safely driven. A prototype system is presented to demonstrate the proposed operation, and the technical feasibility of PCR is verified. The proposed control can also be widely utilized for various high-frequency switching inverters that operate in variable load impedance. | - |
dc.language | English | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.title | SiC-Based 4 MHz 10 kW ZVS Inverter With Fast Resonance Frequency Tracking Control for High-Density Plasma Generators | - |
dc.type | Article | - |
dc.identifier.wosid | 000507286000087 | - |
dc.identifier.scopusid | 2-s2.0-85077233823 | - |
dc.type.rims | ART | - |
dc.citation.volume | 35 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 3266 | - |
dc.citation.endingpage | 3275 | - |
dc.citation.publicationname | IEEE TRANSACTIONS ON POWER ELECTRONICS | - |
dc.identifier.doi | 10.1109/TPEL.2019.2932056 | - |
dc.contributor.localauthor | Cho, Gyu-Hyeong | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | High-density plasma | - |
dc.subject.keywordAuthor | high-frequency high-power inverter | - |
dc.subject.keywordAuthor | high-frequency zero-voltage switching (ZVS) inverter | - |
dc.subject.keywordAuthor | inductively coupled plasma (ICP) | - |
dc.subject.keywordAuthor | resonance frequency tracking | - |
dc.subject.keywordAuthor | variable impedance | - |
dc.subject.keywordPlus | MODULATION | - |
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