Polybenzoxazole/graphene nanocomposite for etching hardmask

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dc.contributor.authorShin, Seung Wookko
dc.contributor.authorKim, Jong-Seonko
dc.contributor.authorKim, Seon Joonko
dc.contributor.authorKim, Dae Wooko
dc.contributor.authorJung, Hee-Taeko
dc.date.accessioned2019-05-29T01:25:03Z-
dc.date.available2019-05-29T01:25:03Z-
dc.date.created2019-05-28-
dc.date.created2019-05-28-
dc.date.issued2019-07-
dc.identifier.citationJOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY, v.75, pp.296 - 303-
dc.identifier.issn1226-086X-
dc.identifier.urihttp://hdl.handle.net/10203/262235-
dc.description.abstractWe demonstrate that graphene can enhance the etch resistance of polymeric hardmask significantly. Graphene oxide with a sub-micrometer diameter (nGO) was functionalized with fluorinated poly (hydroxyamide) (FPHA) via a chemical coupling reaction. The FPHA-functionalized-nGO can be dispersed in various organic solvents including methanol, cyclohexanone, dimethylformamide, and N-methyl pyrrolidone. In addition, the dispersions were spincoated to prepare hardmask films which were then thermally annealed to produce nRGO-fluorinated-polybenzoxazole (FPBO) film. Compared to pristine FPBO film, elastic modulus (122%), hardness (92%), and etch resistance (54%) were significantly enhanced at 17 wt.% graphene loading, surpassing the properties of commercial CHM009 film. (C) 2019 The Korean Society of Industrial and Engineering Chemistry. Published by Elsevier B.V. All rights reserved.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE INC-
dc.titlePolybenzoxazole/graphene nanocomposite for etching hardmask-
dc.typeArticle-
dc.identifier.wosid000466248600034-
dc.identifier.scopusid2-s2.0-85063686080-
dc.type.rimsART-
dc.citation.volume75-
dc.citation.beginningpage296-
dc.citation.endingpage303-
dc.citation.publicationnameJOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY-
dc.identifier.doi10.1016/j.jiec.2019.03.042-
dc.identifier.kciidART002492959-
dc.contributor.localauthorJung, Hee-Tae-
dc.contributor.nonIdAuthorShin, Seung Wook-
dc.contributor.nonIdAuthorKim, Seon Joon-
dc.contributor.nonIdAuthorKim, Dae Woo-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorHardmask-
dc.subject.keywordAuthorComposite-
dc.subject.keywordAuthorGrapheme oxide-
dc.subject.keywordAuthorPatterning-
dc.subject.keywordAuthorEtch resistance-
dc.subject.keywordPlusGRAPHENE OXIDE-
dc.subject.keywordPlusCARBON NANOTUBES-
dc.subject.keywordPlusMEMBRANES-
dc.subject.keywordPlusRESISTANCE-
dc.subject.keywordPlusBEHAVIOR-
dc.subject.keywordPlusWATER-
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