GaAs solar cell on Si substrate with good ohmic GaAs/Si interface by direct wafer bonding

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In this work, we developed wafer bonding techniques to bond GaAs and Si wafers. Wafer bonding was carried out at room temperature without high temperature annealing processes. The bonded interface showed a low interface resistance of 8.8 x 10(-3) Omega cm(2). We also exploited the new bonding techniques to fabricate a GaAs solar cell on a Si substrate. The solar cell showed a high energy conversion efficiency (13.25%) even without an anti reflection coating. The performance of the fabricated GaAs/Si solar cell was comparable to that of a homogeneous GaAs solar cell grown on a GaAs substrate. (C) 2015 Elsevier B.V. All rights reserved.
Publisher
ELSEVIER SCIENCE BV
Issue Date
2015-10
Language
English
Article Type
Article
Citation

SOLAR ENERGY MATERIALS AND SOLAR CELLS, v.141, pp.372 - 376

ISSN
0927-0248
DOI
10.1016/j.solmat.2015.06.021
URI
http://hdl.handle.net/10203/250277
Appears in Collection
RIMS Journal Papers
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