스퍼터링을 통하여 다공성 양극산화 알루미늄 기판에 증착되는 니켈 박막의 기공 크기 조절Control of the Pore Size of Sputtered Nickel Thin Films Supported on an Anodic Aluminum Oxide Substrate

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The pore size of nickel (Ni) bottom electrode layer (BEL) for low-temperature solid oxide fuel cells embedded with ultrathin-film electrolyte was controlled by changing the substrate surface morphology and deposition process parameters. For ~150-nm-thick Ni BEL, the upper side of an anodic aluminum oxide (AAO) substrate with ~65-nm-sized pores provided ~1.7 times smaller pore size than the lower side of the AAO substrate. For ~100-nm-thick Ni BEL, the AAO substrate with ~45-nm-sized pores provided ~2.6 times smaller pore size than the AAO substrate with ~95-nm-sized pores, and the deposition pressure of ~4 mTorr provided ~1.3 times smaller pore size than that of ~48 mTorr. On the AAO substrate with ~65-nm-sized pores, the Ni BEL deposited for 400 seconds had ~2 times smaller pore size than the Ni BEL deposited for 100 seconds.
Publisher
한국수소및신에너지학회
Issue Date
2018
Language
Korean
Keywords

Surface morphology(표면 형상); Process parameter(공정변수); Bottom electrode layer(하부전극층); Anodic aluminum oxide substrate(양극산화 알루미늄 기판); Surface morphology; Process parameter; Bottom electrode layer; Anodic aluminum oxide substrate

Citation

한국수소및신에너지학회논문집, v.29, no.5, pp.434 - 441

ISSN
1738-7264
URI
http://hdl.handle.net/10203/246974
Appears in Collection
MS-Journal Papers(저널논문)
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