DSpace at KOASAS: Unlimited layer-by-layer oxidation of HfS2 for HfS2/HfO2 hybrid structure : A first-principles study

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College of Engineering(공과대학)Graduate school of EEWS(EEWS대학원)EEW-Conference Papers(학술회의논문)

Unlimited layer-by-layer oxidation of HfS2 for HfS2/HfO2 hybrid structure : A first-principles study

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Byeon, Seongjae / LEE, JUHO / Kim, Yong-Hoon researcher

Publisher: GLOBAL FRONTIER R&D Center for Hybrid Interface Materials

Issue Date: 2017-11-06

Language: English

Citation: the 4th International Symposium on Hybrid Materials and Processing

URI: http://hdl.handle.net/10203/238283

Appears in Collection: EEW-Conference Papers(학술회의논문)

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Unlimited layer-by-layer oxidation of HfS2 for HfS2/HfO2 hybrid structure : A first-principles study

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