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Low-Temperature Plasma Etching of Copper Films Using Ultraviolet Irradiation Kang-Sik Choi; Chul-Hi Han, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1, v.37, no.11, pp.5945 - 5948, 1998-11 |
Reaction characteristics between Cu thin film and RF inductively coupled Cl-2 plasma without/with UV irradiation Kwon, MS; Lee, JeongYong; Choi, KS; Han, CH, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.7, pp.4103 - 4108, 1998-07 |
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