Semiconductor Photocatalyst Coated with Graphitic Carbon Film and Method of Fabricating the Same흑연 구조의 탄소막을 코팅한 반도체 광촉매 및 제조방법

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A semiconductor of which a substance such as a semiconductor photocatalyst is uniformly coated on the surface thereof with a graphitic carbon film and a method of fabricating the same are disclosed. According to the inventive method, a graphitic carbon film having a thickness of 1 nm or less is uniformly formed on the surface of the semiconductor by performing hydrothermal synthesis and pyrolysis on glucose, so as to keep the original structure crystallinity of the semiconductor photocatalyst to be a support of the carbon film.
Assignee
KAIST
Country
US (United States)
Issue Date
2015-03-24
Application Date
2012-12-07
Application Number
13708813
Registration Date
2015-03-24
Registration Number
8987164
URI
http://hdl.handle.net/10203/231520
Appears in Collection
EEW-Patent(특허)
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