Reliability improvement of a flexible FD-SOI MOSFET via heat management

Cited 5 time in webofscience Cited 0 time in scopus
  • Hit : 1132
  • Download : 0
DC FieldValueLanguage
dc.contributor.authorBong, Jae Hoonko
dc.contributor.authorKim, Seung-Yoonko
dc.contributor.authorJeong, Chan Baeko
dc.contributor.authorChang, Ki Sooko
dc.contributor.authorHwang, Wan Sikko
dc.contributor.authorCho, Byung Jinko
dc.date.accessioned2017-08-08T06:53:08Z-
dc.date.available2017-08-08T06:53:08Z-
dc.date.created2017-08-07-
dc.date.created2017-08-07-
dc.date.created2017-08-07-
dc.date.created2017-08-07-
dc.date.issued2017-06-
dc.identifier.citationAPPLIED PHYSICS LETTERS, v.110, no.25-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10203/225242-
dc.description.abstractUltra-thin single-crystalline Si membrane transistors on a polymer substrate have drawn attention for flexible electronics applications. However, these devices accompany a reliability issue stemming from severe self-heating because of the inherent poor thermal conductivity of the polymer substrate. In the present study, under an operational condition of V-G = 3V and V-D = 8V, the temperature of the Si membrane transistor on the polymer substrate soared to about 64 degrees C immediately and remained consistently high. The excess heat generated from the active channel significantly degraded the device performance. However, the implementation of a silver heat spreading layer (HSL) between the active channel and the polymer substrate significantly alleviated the self-heating effect as the silver film rapidly spread the generated heat. The efficient heat spreading, monitored via a high resolution infrared thermal microscope, correlated well with the charge transfer characteristics of the device. These results may be helpful to realize high performance flexible devices using a silicon membrane. Published by AIP Publishing.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.titleReliability improvement of a flexible FD-SOI MOSFET via heat management-
dc.typeArticle-
dc.identifier.wosid000404337800014-
dc.identifier.scopusid2-s2.0-85021068940-
dc.type.rimsART-
dc.citation.volume110-
dc.citation.issue25-
dc.citation.publicationnameAPPLIED PHYSICS LETTERS-
dc.identifier.doi10.1063/1.4986475-
dc.contributor.localauthorCho, Byung Jin-
dc.contributor.nonIdAuthorJeong, Chan Bae-
dc.contributor.nonIdAuthorChang, Ki Soo-
dc.contributor.nonIdAuthorHwang, Wan Sik-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordPlusTHIN-FILM TRANSISTORS-
dc.subject.keywordPlusSILICON INTEGRATED-CIRCUITS-
dc.subject.keywordPlusRIBBONS-
Appears in Collection
EE-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 5 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0