DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Woon Ik | ko |
dc.contributor.author | Tong, Sheng | ko |
dc.contributor.author | Liu, Yuzi | ko |
dc.contributor.author | Jung, Il Woong | ko |
dc.contributor.author | Roelofs, Andreas | ko |
dc.contributor.author | Hong, Seungbum | ko |
dc.date.accessioned | 2017-02-02T01:52:40Z | - |
dc.date.available | 2017-02-02T01:52:40Z | - |
dc.date.created | 2017-01-17 | - |
dc.date.created | 2017-01-17 | - |
dc.date.created | 2017-01-17 | - |
dc.date.issued | 2014 | - |
dc.identifier.citation | NANOSCALE, v.6, no.24, pp.15216 - 15221 | - |
dc.identifier.issn | 2040-3364 | - |
dc.identifier.uri | http://hdl.handle.net/10203/220259 | - |
dc.description.abstract | Pattern generation of well-controlled block copolymers (BCPs) with a high Flory-Huggins interaction parameter (chi) is important for applications in sub-20 nm nanolithography. We used mixed solvents of dimethylformamide (DMF) and toluene to control the morphology as well as the time to achieve the targeted morphology via self-assembly of BCPs. By precisely controlling the volume ratio of DMF and toluene, well-ordered line, honeycomb, circular hole, and lamellar nanostructures were obtained from a cylinder-forming poly(styrene-b-2-vinylpyridine) (PS-b-P2VP) BCP with high chi. Furthermore, a well-aligned 12 nm line pattern was successfully achieved in the guiding template within one minute using the mixed solvents. This practical method may also be applicable to self-assembly of other BCPs, providing more opportunities for the next-generation sub-10 nm lithography applications. | - |
dc.language | English | - |
dc.publisher | ROYAL SOC CHEMISTRY | - |
dc.subject | THIN-FILMS | - |
dc.subject | TEMPLATES | - |
dc.subject | NANOLITHOGRAPHY | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | PATTERNS | - |
dc.subject | NANOSTRUCTURES | - |
dc.subject | GRAPHOEPITAXY | - |
dc.subject | ORIENTATION | - |
dc.subject | TEMPERATURE | - |
dc.subject | FABRICATION | - |
dc.title | Tunable and rapid self-assembly of block copolymers using mixed solvent vapors | - |
dc.type | Article | - |
dc.identifier.wosid | 000345458200077 | - |
dc.identifier.scopusid | 2-s2.0-84911893767 | - |
dc.type.rims | ART | - |
dc.citation.volume | 6 | - |
dc.citation.issue | 24 | - |
dc.citation.beginningpage | 15216 | - |
dc.citation.endingpage | 15221 | - |
dc.citation.publicationname | NANOSCALE | - |
dc.identifier.doi | 10.1039/c4nr04726e | - |
dc.contributor.localauthor | Hong, Seungbum | - |
dc.contributor.nonIdAuthor | Park, Woon Ik | - |
dc.contributor.nonIdAuthor | Tong, Sheng | - |
dc.contributor.nonIdAuthor | Liu, Yuzi | - |
dc.contributor.nonIdAuthor | Jung, Il Woong | - |
dc.contributor.nonIdAuthor | Roelofs, Andreas | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | TEMPLATES | - |
dc.subject.keywordPlus | NANOLITHOGRAPHY | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | PATTERNS | - |
dc.subject.keywordPlus | NANOSTRUCTURES | - |
dc.subject.keywordPlus | GRAPHOEPITAXY | - |
dc.subject.keywordPlus | ORIENTATION | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordPlus | FABRICATION | - |
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