ENHANCED SB DIFFUSION IN SI UNDER THERMAL SI3N4 FILMS DURING ANNEALING IN AR
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ahn, SungTae | ko |
| dc.contributor.author | KENNEL, HW | ko |
| dc.contributor.author | PLUMMER, JD | ko |
| dc.contributor.author | TILLER, WA | ko |
| dc.date.accessioned | 2016-11-30T01:51:11Z | - |
| dc.date.available | 2016-11-30T01:51:11Z | - |
| dc.date.created | 2016-11-10 | - |
| dc.date.created | 2016-11-10 | - |
| dc.date.issued | 1988-10 | - |
| dc.identifier.citation | APPLIED PHYSICS LETTERS, v.53, no.17, pp.1593 - 1595 | - |
| dc.identifier.issn | 0003-6951 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/214186 | - |
| dc.language | English | - |
| dc.publisher | AMER INST PHYSICS | - |
| dc.title | ENHANCED SB DIFFUSION IN SI UNDER THERMAL SI3N4 FILMS DURING ANNEALING IN AR | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1988Q621100007 | - |
| dc.identifier.scopusid | 2-s2.0-1642589947 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 53 | - |
| dc.citation.issue | 17 | - |
| dc.citation.beginningpage | 1593 | - |
| dc.citation.endingpage | 1595 | - |
| dc.citation.publicationname | APPLIED PHYSICS LETTERS | - |
| dc.identifier.doi | 10.1063/1.100439 | - |
| dc.contributor.localauthor | Ahn, SungTae | - |
| dc.contributor.nonIdAuthor | KENNEL, HW | - |
| dc.contributor.nonIdAuthor | PLUMMER, JD | - |
| dc.contributor.nonIdAuthor | TILLER, WA | - |
| dc.description.isOpenAccess | N | - |
| dc.type.journalArticle | Article | - |
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