350°C processable low-CTE transparent glass-fabric-reinforced hybrimer film for flexible substrates

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dc.contributor.authorKim, Hwea Yoonko
dc.contributor.authorJin, Junghoko
dc.contributor.authorPark, Sang-Hee Koko
dc.contributor.authorEom, In Yongko
dc.contributor.authorBae, Byeong-Sooko
dc.date.accessioned2016-07-25T08:28:56Z-
dc.date.available2016-07-25T08:28:56Z-
dc.date.created2016-07-14-
dc.date.created2016-07-14-
dc.date.created2016-07-14-
dc.date.issued2015-01-
dc.identifier.citationJOURNAL OF INFORMATION DISPLAY, v.16, no.1, pp.57 - 64-
dc.identifier.issn1598-0316-
dc.identifier.urihttp://hdl.handle.net/10203/211893-
dc.description.abstractPresented herein is an optically transparent glass-fabric-reinforced hybrimer film (350-GFRHybrimer film) featuring a low coefficient of thermal expansion (12–14 ppm/°C) and high-temperature processability (350°C). The 350-GFRHybrimer film was fabricated with glass-woven fabrics as reinforcement, and a highly thermally stable siloxane hybrid resin as a matrix. To confirm the potential of the 350-GFRHybrimer film as a flexible substrate, 350°C-processed oxide thin film transistor arrays are demonstrated on the 350-GFRHybrimer film.-
dc.languageEnglish-
dc.publisherTAYLOR & FRANCIS LTD-
dc.title350°C processable low-CTE transparent glass-fabric-reinforced hybrimer film for flexible substrates-
dc.typeArticle-
dc.identifier.scopusid2-s2.0-84924974980-
dc.type.rimsART-
dc.citation.volume16-
dc.citation.issue1-
dc.citation.beginningpage57-
dc.citation.endingpage64-
dc.citation.publicationnameJOURNAL OF INFORMATION DISPLAY-
dc.identifier.doi10.1080/15980316.2014.1003984-
dc.contributor.localauthorPark, Sang-Hee Ko-
dc.contributor.localauthorBae, Byeong-Soo-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthortransparent flexible substrate-
dc.subject.keywordAuthorfiber-reinforced plastic-
dc.subject.keywordAuthorcoefficient of thermal expansion-
dc.subject.keywordAuthorthermal stability-
dc.subject.keywordAuthoroxide thin film transistor-
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