긴 레이저 조사방식에 의한 저밀도 이광자 광중합 영역을 이용한 Sub-100 nm 정밀도의 엠보싱 패턴제작Fabrication of Sub-100 nm Embossing Patterns using Weakly-Polymerized Region via Long-Exposure Technique (LET) in two-Photon Polymerization
- Publisher
- 한국정밀공학회
- Issue Date
- 2007-01
- Language
- Korean
- Citation
한국정밀공학회지, v.24, no.1, pp.64 - 70
- ISSN
- 1225-9071
- Appears in Collection
- ME-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
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