긴 레이저 조사방식에 의한 저밀도 이광자 광중합 영역을 이용한 Sub-100 nm 정밀도의 엠보싱 패턴제작Fabrication of Sub-100 nm Embossing Patterns using Weakly-Polymerized Region via Long-Exposure Technique (LET) in two-Photon Polymerization

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Publisher
한국정밀공학회
Issue Date
2007-01
Language
Korean
Citation

한국정밀공학회지, v.24, no.1, pp.64 - 70

ISSN
1225-9071
URI
http://hdl.handle.net/10203/205471
Appears in Collection
ME-Journal Papers(저널논문)
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