Machine learning (ML)-guided OPC using basis functions of polar Fourier transform

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dc.contributor.authorShim, Seongboko
dc.contributor.authorChoi, Su Hyeongko
dc.contributor.authorShin, Young Sooko
dc.date.accessioned2016-04-18T04:40:02Z-
dc.date.available2016-04-18T04:40:02Z-
dc.date.created2015-11-23-
dc.date.issued2016-02-24-
dc.identifier.citationSPIE Advanced Lithography-
dc.identifier.urihttp://hdl.handle.net/10203/204123-
dc.languageEnglish-
dc.publisherSPIE-
dc.titleMachine learning (ML)-guided OPC using basis functions of polar Fourier transform-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameSPIE Advanced Lithography-
dc.identifier.conferencecountryUS-
dc.identifier.conferencelocationSan Jose Marriott and San Jose Convention Center-
dc.contributor.localauthorShin, Young Soo-
dc.contributor.nonIdAuthorChoi, Su Hyeong-
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EE-Conference Papers(학술회의논문)
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