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NO	Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)
1	Recessed Channel(RC) SOI NMOSFET's with Self-Aligned Polysilicon Gate Formed on the RC Region Hyung-Cheol Shin, Proc. IEEE International SOI Conference, pp.122 - 123, 1996
2	Process-Induced Charging Damage in PETEOS for Interlevel Dielectric Applications Hyung-Cheol Shin, International Symposium on Plasma Process-Induced Damage, pp.109 - 112, 1996
3	TFSOI Complementary BiCMOS Technology for Low Power RF Mixed-Mode Applications Hyung-Cheol Shin, IEEE Custom Integrated Circuits Conference, pp.35 - 38, 1996

Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date)

Hyung-Cheol Shin, Proc. IEEE International SOI Conference, pp.122 - 123, 1996

Hyung-Cheol Shin, International Symposium on Plasma Process-Induced Damage, pp.109 - 112, 1996

Hyung-Cheol Shin, IEEE Custom Integrated Circuits Conference, pp.35 - 38, 1996

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