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| NO | Title, Author(s) (Publication Title, Volume Issue, Page, Issue Date) |
|---|---|
| Short Channel Effects in N- and P- Channel Polysilicon Thin Film Transistors with Very Thin ECR N2O Plasma Gate Dielectrics Chul-Hi Han, The International Conference on Solid State Devices and Materials, pp.372 - 373, 1997 | |
| ECR O2-N2O Plasma Thermal Oxide and Its Application to Polysilicon Thin Film Transistors Chul-Hi Han, 9th Hungarian-Korean Seminar, pp.241 - 250, 1997 | |
| Plama Etching of Copper Films Using Ultra Violet Radiation Chul-Hi Han, The International Conference on Solid State Devices and Materials, pp.300 - 301, 1997 | |
| Suppressed Short-Channel Effects and Improved Stability in Polysilicon Thin Film Transistors with Very Thin ECR N2O-Pkasma Gate Oxide Chul-Hi Han, Technical Digest of International Electron Devices Meeting, Washington D.C, pp.519 - 521, 1997 | |
| Statistical Analysis of Polysilicon Thin Film Transistor Load SRAM Sensitivity to Device Parameter Chul-Hi Han, Technical digest of International Conference on VLSI and CAD, pp.74 - 76, 1997 | |
| Highly Reliable Interpoly Oxide Using ECR N2O-Plasma for Next Generation Flash Memory Chul-Hi Han, The International Conference on Solid State Devices and Materials, pp.16 - 17, 1997 |
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