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Ultrathin silicon dioxide formation by ozone on ultraflat SI surface

Kurokawa A.; Maeda T.; Sakamoto K.; Itoh H.; Nakamura K.; Koike K.; Moon D.W.; et al, Proceedings of the 1999 MRS Spring Meeting - Symposium on Ultrathin SiO2 and High-k Materials for ULSI Gate Dielectrics, v.567, pp.21 - 26, 1999-04-05

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