Browse "School of Electrical Engineering(전기및전자공학부)" by Subject 강유전체▼a하프늄 산화막▼a지르코늄 산화막▼a중간층▼a인장응력
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| Enhancing ferroelectricity of $HfO_2$ by inserting $ZrO_2$ interlayer on Si substrate = 실리콘 기판 위에 지르코늄 산화막 중간층 삽입을 통한 하프늄 산화막의 강유전성 개선link Lee, Sang Jae; Cho, Byung Jin; et al, 한국과학기술원, 2019 |
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