Browse "School of Electrical Engineering(전기및전자공학부)" by Author N. Balasubramanian, N

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A novel approach for integration of dual metal gate process using ultra thin aluminum nitride buffer layer

Cho, Byung Jin; Park, CS; N. Balasubramanian, N; Kwong, DL, Symposium on VLSI Technology, pp.149 - 149, 2003-06-10

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