Browse "School of Electrical Engineering(전기및전자공학부)" byAuthorYu, HY

Showing results 1 to 10 of 10

1
ALD (HfO2)x(Al2O3)1-x high-K gate dielectrics for advanced MOS devices application

Cho, Byung Jinresearcher; Yu, HY; Wu, N; Yeo, C; Joo, MS; Li, MF; Zhu, C, 2nd International Conference on Materials for Advanced Technologies, pp.562 - 562, 2003-12-11

2
Electrical and physical properties of Si1-xGex/HfO2/Si MOS-capacitors

Cho, Byung Jinresearcher; Wu, N; Zhu, C; Balasubramanian, N; Yeo, CC; Joo, MS; Yu, HY, 2nd International Conference on Materials for Advanced Technologies, pp.535 - 535, 2003-12-11

3
Energy gap and band alignment for (HfO2)(x)(Al2O3)(1-x) on (100) Si

Yu, HY; Li, MF; Cho, Byung Jinresearcher; Yeo, CC; Joo, MS; Kwong, DL; Pan, JS; et al, APPLIED PHYSICS LETTERS, v.81, no.2, pp.376 - 378, 2002-07

4
Energy gap and band alignment of (HfO2)x(Al2O3)1-x on (100) Si by XPS

Cho, Byung Jinresearcher; Yu, HY; Li, MF; Kwong, DL; Pan, JS; Ang, CH; Zheng, JZ, 2002 International Conf. on Solid State Devices and Materials (SSDM), pp.0 - 0, 2002-12-17

5
Enhanced surface evolution induced by the molecular desorption in dodecanethiol self-assembled monolayer on Au(111)

Pi, UH; Kim, JH; Yu, HY; Chan Woo Park; Choi, Sung-Yoolresearcher; Yong-Kwan Kim; Jeong Sook Ha, SURFACE SCIENCE, v.600, pp.625 - 631, 2006-02

6
Fabrication of nano-gap electrode pairs using atomic-layer-deposited sacrificial layer and shadow deposition

Park, CW; Lim, JW; Yu, HY; Pi, UH; Ryu, MK; Choi, Sung-Yoolresearcher, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, v.45, pp.4293 - 4295, 2006-05

7
Properties of PVD Hafnium oxide films in metal-insulator-metal structure and the role of HfN barrier at dielectric/metal interface

Cho, Byung Jinresearcher; Kim, SJ; Lim, HF; Hu, H; Yu, XF; Yu, HY; Li, MF, 2nd International Conference on Materials for Advanced Technologies, pp.513 - 513, 2003-12-11

8
Study of PVD HfO2 and HfOxNy as dielectrics for MIM capacitor application

Cho, Byung Jinresearcher; Lim, HF; Kim, SJ; Hu, H; Yu, XF; Yu, HY; Li, MF, International Conference on Materials for Advanced Technologies, pp.532 - 532, 2003-12-11

9
The fabrication technique and electrical properties of a free-standing GaN nanowire

Yu, HY; Kang, BH; Park, CW; Pi, UH; Lee, CJ; Choi, Sung-Yoolresearcher, APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, v.81, no.2, pp.245 - 247, 2005-07

10
Thermal stability of (HfO2)(x)(Al2O3)(1-x) on Si

Yu, HY; Wu, N; Li, MF; Zhu, CX; Cho, Byung Jinresearcher; Kwong, DL; Tung, CH; et al, APPLIED PHYSICS LETTERS, v.81, no.19, pp.3618 - 3620, 2002-11

Discover

Type

. next

Open Access

Date issued

. next

Subject

. next

rss_1.0 rss_2.0 atom_1.0