Showing results 1 to 6 of 6
A comparative study of multiple and single pulse laser annealing for ultrashallow boron junction formation Cho, Byung Jin; Poon, D; Lu, YF; Bhat, M; See, A, Ultra-Shallow Junctions-2003 Workshop, pp.0 - 0, 2003-04-27 |
Boron profile narrowing in laser-processed silicon after rapid thermal anneal Poon, CH; Tan, LS; Cho, Byung Jin; See, A; Bhat, M, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.151, no.1, pp.80 - 83, 2004-01 |
Electrical evaluation of laser annealed junctions by Hall measurement Cho, Byung Jin; Poon, DCH; Tan, LS; Bhat, M; Chan, L, 2nd International Conference on Materials for Advanced Technologies, pp.578 - 578, 2003-12-11 |
Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization Cho, Byung Jin; Poon, D; Tan, LS; Bhat, M; See, A, IEEE 4th International Workshop on Junction Technology (IWJT-2004), pp.22 - 26, 2004-03-15 |
Multiple-pulse laser annealing of preamorphized silicon for ultrashallow boron junction formation Poon, CH; Cho, Byung Jin; Lu, YF; Bhat, M; See, A, JOURNAL OF VACUUM SCIENCE TECHNOLOGY B, v.21, no.2, pp.706 - 709, 2003-02 |
Process optimization for multiple-pulse laser annealing of boron implanted silicon with germanium pre-amorphization Cho, Byung Jin; Poon, D; Lu, YF; Bhat, M; See, A, MRS Spring Meeting, pp.0 - 0, 2003-04-22 |
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