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Oxygen partial pressure and thermal annealing dependent properties of RF magnetron sputtered TiO2-x films Reddy, Y. Ashok Kumar; Kang, In-ku; Shin, Young Bong; Lee, Hee-Chul; Reddy, P. Sreedhara, MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v.32, pp.107 - 116, 2015-04 |
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