Showing results 9 to 23 of 23
Light Interference Map: A Prescriptive Optimization of Lithography-Friendly Layout Shim, Seongbo; Choi, Suhyeong; Shin, Youngsoo, IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.29, no.1, pp.44 - 49, 2016-02 |
Lithographic defect aware placement using compact standard cells without inter-cell margin Shim, Seongbo; Lee, Yoojong; Shin, Youngsoo, Asia South Pacific Design Automation Conference, pp.47 - 52, IEEE, 2014-01-20 |
Lithography Defect Probability and Its Application to Physical Design Optimization Shim, Seongbo; Chung, Woohyun; Shin, Youngsoo, IEEE TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (VLSI) SYSTEMS, v.25, no.1, pp.271 - 285, 2017-01 |
Machine learning (ML)-based lithography optimizations Shin, Youngsoo; Shim, Seongbo; Choi, Suhyeong, IEEE Asia Pacific Conference on Circuits and Systems, IEEE, 2016-10-25 |
Machine learning (ML)-guided OPC using basis functions of polar Fourier transform Shim, Seongbo; Choi, Su Hyeong; Shin, Young Soo, SPIE Advanced Lithography, SPIE, 2016-02-24 |
Machine learning-based 3D resist model Shim, Seongbo; Choi, Suhyeong; Shin, Youngsoo, SPIE Advanced Lithography, SPIE, 2017-02-26 |
Machine learning-based resist 3D model Shim, Seongbo; Choi, Suhyeong; Shin, Youngsoo, Optical Microlithography XXX 2017, SPIE, 2017-02 |
Machine Learning-Guided Etch Proximity Correction Shim, Seongbo; Shin, Youngsoo, IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, v.30, no.1, pp.1 - 7, 2017-02 |
Neural network classifier-based OPC with imbalanced training data Choi, Suhyeong; Shim, Seongbo; Shin, Youngsoo, IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS, v.38, no.5, pp.938 - 948, 2019-05 |
Physical design and mask synthesis for directed self-assembly lithography = 직접 자기조립 리소그라피를 위한 회로 설계 및 마스크 합성 연구link Shim, Seongbo; 심성보; et al, 한국과학기술원, 2016 |
Placement optimization for MP-DSAL compliant layout Shim, Seongbo; Chung, Woohyun; Shin, Youngsoo, IEEE International Conference on IC Design and Technology (ICICDT), IEEE/ACM, 2016-06-27 |
Redundant via insertion for multiple-patterning directed-self-assembly lithography Shim, Seongbo; Chung, Woohyun; Shin, Youngsoo, 53rd Design Automation Conference (DAC), pp.41:1 - 41:6, ACM Special Interest Group on Design Automation (SIGDA), 2016-06-06 |
Synthesis of lithographic test patterns through topology-oriented pattern extraction and classification Shim, Seongbo; CHUNG, WOOHYUN; Shin, Youngsoo, SPIE Advanced Lithography, pp.1 - 10, SPIE, 2014-02-25 |
Topology-oriented pattern extraction and classification for synthesizing lithography test patterns Shim, Seongbo; Shin, Youngsoo, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, v.14, no.1, 2015-01 |
Verification of Directed Self-Assembly (DSA) Guide Patterns through Machine Learning Shim, Seongbo; Cai, Sibo; Yang, Seunghune; Choi, Jungdal; Shin, Youngsoo, Conference on Alternative Lithographic Technologies VII, SPIE, 2015-02-26 |
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