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Dependence of optimized annealing temperature for tetragonal phase formation on the Si concentration of atomic-layer-deposited Hf-silicate film Kim, Hyo Kyeom; Jung, Hyung-Suk; Jang, Jae Hyuck; Park, Jinho; Park, Tae Joo; Lee, Seok-Hee; Hwang, Cheol Seong, JOURNAL OF APPLIED PHYSICS, v.110, no.11, 2011-12 |
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