Properties and Reliability of Solder Microbump Joints Between Si Chips and a Flexible Substrate

Abstract

Future generations of electronics are expected to include flexible, bendable, and wearable devices. There have been very few studies, however, on the bonding technology and reliability of bonding joints between a chip and a flexible substrate. In this study, we investigated the properties and reliability of joints formed with Sn-58Bi solder microbumps between a Si chip and a flexible substrate. For fine-pitch bonding, we formed Cu pillar bumps and Sn-58Bi solder microbumps with diameter of 25 mu m by electroplating. The Si chips were then bonded on a flexible substrate finished with electroless nickel immersion gold (ENIG) using flip-chip technology, processing at 170A degrees C under a force of 1 N, 2 N, or 3 N for 15 s. Cross-sectional images of bump joints were analyzed using field-emission scanning electron microscopy. While the Cu6Sn5 intermetallic compound (IMC) was formed on the Cu-pillar-bump side, another IMC, Ni3Sn4, was formed on the ENIG-substrate side. In addition, we performed a shear test, thermal shock test, and bending test to evaluate the joints' mechanical properties and reliability. The bending test was performed by a machine designed for joints on flexible substrates. Unit shear force of 2 N was the nominally highest value obtained from joints prepared under the three bonding conditions. After the thermal shock test, we observed cracks initiated at the Cu6Sn5/Sn-58Bi interface, which then propagated within the solder bumps or at the interface. In the case of the bending test, failure occurred at the Ni3Sn4/Sn-58Bi interface or within the solder bumps.