Near-field thermal radiation between doped silicon plates at nanoscale gaps

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dc.contributor.authorLim, Mikyungko
dc.contributor.authorLee, Seung-Seobko
dc.contributor.authorLee, Bong Jaeko
dc.date.accessioned2015-06-29T04:44:46Z-
dc.date.available2015-06-29T04:44:46Z-
dc.date.created2015-06-23-
dc.date.created2015-06-23-
dc.date.created2015-06-23-
dc.date.issued2015-05-
dc.identifier.citationPHYSICAL REVIEW B, v.91, no.19-
dc.identifier.issn2469-9950-
dc.identifier.urihttp://hdl.handle.net/10203/199463-
dc.description.abstractRadiative heat transfer can be significantly enhanced via photon tunneling through a nanometer-scale gap to the point that it exceeds the blackbody limit. Here we report quantitative measurements of the near-field thermal radiation between doped-Si plates (width = 480 mu m and length = 1.34 cm). A novel MEMS-based platform enables us to maintain doped-Si plates at nanoscale gap distances that cannot be achieved by other methods. The measured radiative heat transfer coefficient was found to be 2.91 times greater than the blackbody limit at a 400-nm vacuum gap.-
dc.languageEnglish-
dc.publisherAMER PHYSICAL SOC-
dc.titleNear-field thermal radiation between doped silicon plates at nanoscale gaps-
dc.typeArticle-
dc.identifier.wosid000355090400002-
dc.identifier.scopusid2-s2.0-84930221947-
dc.type.rimsART-
dc.citation.volume91-
dc.citation.issue19-
dc.citation.publicationnamePHYSICAL REVIEW B-
dc.identifier.doi10.1103/PhysRevB.91.195136-
dc.contributor.localauthorLee, Seung-Seob-
dc.contributor.localauthorLee, Bong Jae-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordPlusCLOSELY-SPACED BODIES-
dc.subject.keywordPlusHEAT-TRANSFER-
dc.subject.keywordPlusMETALLIC SURFACES-
dc.subject.keywordPlusDISTANCES-
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