DC Field | Value | Language |
---|---|---|
dc.contributor.author | You, Daeho | ko |
dc.contributor.author | Lee, Yun-Seong | ko |
dc.contributor.author | Lee, Jeong Beom | ko |
dc.contributor.author | Chang, Hong-Young | ko |
dc.date.accessioned | 2015-04-08T07:01:43Z | - |
dc.date.available | 2015-04-08T07:01:43Z | - |
dc.date.created | 2015-03-30 | - |
dc.date.created | 2015-03-30 | - |
dc.date.issued | 2015-03 | - |
dc.identifier.citation | CURRENT APPLIED PHYSICS, v.15, no.3, pp.183 - 189 | - |
dc.identifier.issn | 1567-1739 | - |
dc.identifier.uri | http://hdl.handle.net/10203/195855 | - |
dc.description.abstract | Transformer-coupled toroidal plasma (TCTP) has found applications in versatile fields as a high-power-density plasma source. However, most research on TCTP has focused on plasma states in the TCTP, without any change in reactor structures. Therefore, in this paper, we present a study on the effects of inner-surface modification of a TCTP reactor on plasma conditions. Using two types of reactors with different inner surfaces, the silicon-wafer etch rate by fluorine atoms from dissociated NF3 gas molecules is compared. Then a computer simulation, which derives various plasma parameters, is carried out. As a result, the TCTP reactor with a grooved inner surface shows a higher etch rate than the reactor with a normal inner surface. The computer simulation suggests the reason for this etch rate difference is that the reactor with the grooved inner surface structure has a higher neutral gas temperature than the reactor with the normal inner surface so that more pyrolytic dissociation, resulting in a higher fluorine atom density, is achieved. Our results may be useful for those fields that require a higher neutral temperature or a higher degree of pyrolysis. | - |
dc.language | English | - |
dc.publisher | ELSEVIER SCIENCE BV | - |
dc.subject | DISCHARGE | - |
dc.subject | ANTENNA | - |
dc.title | Effect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma | - |
dc.type | Article | - |
dc.identifier.wosid | 000349904900005 | - |
dc.identifier.scopusid | 2-s2.0-84919626380 | - |
dc.type.rims | ART | - |
dc.citation.volume | 15 | - |
dc.citation.issue | 3 | - |
dc.citation.beginningpage | 183 | - |
dc.citation.endingpage | 189 | - |
dc.citation.publicationname | CURRENT APPLIED PHYSICS | - |
dc.identifier.doi | 10.1016/j.cap.2014.12.008 | - |
dc.contributor.localauthor | Chang, Hong-Young | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | Transformer coupled toroidal plasma | - |
dc.subject.keywordAuthor | Etch rate | - |
dc.subject.keywordAuthor | Pyrolysis | - |
dc.subject.keywordAuthor | Neutral gas temperature | - |
dc.subject.keywordAuthor | CFD | - |
dc.subject.keywordPlus | DISCHARGE | - |
dc.subject.keywordPlus | ANTENNA | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.