Effect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma

Cited 1 time in webofscience Cited 0 time in scopus
  • Hit : 386
  • Download : 0
DC FieldValueLanguage
dc.contributor.authorYou, Daehoko
dc.contributor.authorLee, Yun-Seongko
dc.contributor.authorLee, Jeong Beomko
dc.contributor.authorChang, Hong-Youngko
dc.date.accessioned2015-04-08T07:01:43Z-
dc.date.available2015-04-08T07:01:43Z-
dc.date.created2015-03-30-
dc.date.created2015-03-30-
dc.date.issued2015-03-
dc.identifier.citationCURRENT APPLIED PHYSICS, v.15, no.3, pp.183 - 189-
dc.identifier.issn1567-1739-
dc.identifier.urihttp://hdl.handle.net/10203/195855-
dc.description.abstractTransformer-coupled toroidal plasma (TCTP) has found applications in versatile fields as a high-power-density plasma source. However, most research on TCTP has focused on plasma states in the TCTP, without any change in reactor structures. Therefore, in this paper, we present a study on the effects of inner-surface modification of a TCTP reactor on plasma conditions. Using two types of reactors with different inner surfaces, the silicon-wafer etch rate by fluorine atoms from dissociated NF3 gas molecules is compared. Then a computer simulation, which derives various plasma parameters, is carried out. As a result, the TCTP reactor with a grooved inner surface shows a higher etch rate than the reactor with a normal inner surface. The computer simulation suggests the reason for this etch rate difference is that the reactor with the grooved inner surface structure has a higher neutral gas temperature than the reactor with the normal inner surface so that more pyrolytic dissociation, resulting in a higher fluorine atom density, is achieved. Our results may be useful for those fields that require a higher neutral temperature or a higher degree of pyrolysis.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE BV-
dc.subjectDISCHARGE-
dc.subjectANTENNA-
dc.titleEffect of reactor surface modification on the neutral gas temperature in a transformer-coupled toroidal plasma-
dc.typeArticle-
dc.identifier.wosid000349904900005-
dc.identifier.scopusid2-s2.0-84919626380-
dc.type.rimsART-
dc.citation.volume15-
dc.citation.issue3-
dc.citation.beginningpage183-
dc.citation.endingpage189-
dc.citation.publicationnameCURRENT APPLIED PHYSICS-
dc.identifier.doi10.1016/j.cap.2014.12.008-
dc.contributor.localauthorChang, Hong-Young-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorTransformer coupled toroidal plasma-
dc.subject.keywordAuthorEtch rate-
dc.subject.keywordAuthorPyrolysis-
dc.subject.keywordAuthorNeutral gas temperature-
dc.subject.keywordAuthorCFD-
dc.subject.keywordPlusDISCHARGE-
dc.subject.keywordPlusANTENNA-
Appears in Collection
PH-Journal Papers(저널논문)
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 1 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0