DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | 노광수 | - |
dc.contributor.advisor | No, Kwang-Soo | - |
dc.contributor.author | 김성관 | - |
dc.contributor.author | Kim, Sung-Kwan | - |
dc.date.accessioned | 2013-09-12T04:41:50Z | - |
dc.date.available | 2013-09-12T04:41:50Z | - |
dc.date.issued | 2006 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=487896&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/181934 | - |
dc.description | 학위논문(박사) - 한국과학기술원 : 신소재공학과, 2006.8, [ xiii, 155 p. ] | - |
dc.language | kor | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | 전자 상태 | - |
dc.subject | 위상 변위 마스크 | - |
dc.subject | 광학 특성 | - |
dc.subject | HfO2 | - |
dc.subject | phase shift mask | - |
dc.subject | electronic structures | - |
dc.subject | optical properties | - |
dc.subject | HfO2 | - |
dc.subject | Hf-O-N | - |
dc.subject | Hf-O-N | - |
dc.title | ArF laser lithography 용 위상 변위 막을 위한 Transition metal (Hf, Zr) oxide, oxynitride 박막의 전자 상태 및 광학 특성 분석 | - |
dc.title.alternative | The electronic structures and optical properties of transition metal (Hf, Zr) oxide and oxynitride thin films as phase shift mask for ArF laser lithography | - |
dc.type | Thesis(Ph.D) | - |
dc.identifier.CNRN | 487896/325007 | - |
dc.description.department | 한국과학기술원 : 신소재공학과, | - |
dc.identifier.uid | 020035041 | - |
dc.contributor.localauthor | 노광수 | - |
dc.contributor.localauthor | No, Kwang-Soo | - |
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