ArF laser lithography 용 위상 변위 막을 위한 Transition metal (Hf, Zr) oxide, oxynitride 박막의 전자 상태 및 광학 특성 분석The electronic structures and optical properties of transition metal (Hf, Zr) oxide and oxynitride thin films as phase shift mask for ArF laser lithography

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dc.contributor.advisor노광수-
dc.contributor.advisorNo, Kwang-Soo-
dc.contributor.author김성관-
dc.contributor.authorKim, Sung-Kwan-
dc.date.accessioned2013-09-12T04:41:50Z-
dc.date.available2013-09-12T04:41:50Z-
dc.date.issued2006-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=487896&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/181934-
dc.description학위논문(박사) - 한국과학기술원 : 신소재공학과, 2006.8, [ xiii, 155 p. ]-
dc.languagekor -
dc.publisher한국과학기술원-
dc.subject전자 상태-
dc.subject위상 변위 마스크-
dc.subject광학 특성-
dc.subjectHfO2-
dc.subjectphase shift mask-
dc.subjectelectronic structures-
dc.subjectoptical properties-
dc.subjectHfO2-
dc.subjectHf-O-N-
dc.subjectHf-O-N-
dc.titleArF laser lithography 용 위상 변위 막을 위한 Transition metal (Hf, Zr) oxide, oxynitride 박막의 전자 상태 및 광학 특성 분석-
dc.title.alternativeThe electronic structures and optical properties of transition metal (Hf, Zr) oxide and oxynitride thin films as phase shift mask for ArF laser lithography-
dc.typeThesis(Ph.D)-
dc.identifier.CNRN487896/325007 -
dc.description.department한국과학기술원 : 신소재공학과, -
dc.identifier.uid020035041-
dc.contributor.localauthor노광수-
dc.contributor.localauthorNo, Kwang-Soo-
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